| Publisher | Hitachi | ||
|---|---|---|---|
| Format | 118.4KB PDF, requires Acrobat Rdr 5 | Date added | 18 Oct 2002 |
| Topics | Semiconductor Tech. - Manufacturing | ||
| Downloads | 36 | ||
With the semiconductor device manufacturing industry moving to the 100-nm node era, CD-SEMs (critical-dimension scanning electron microscopes) need to have further improved CD measurement reproducibility as well as observation performance. In addition, the demand is growing for functionalities applicable to new fabrication processes, such as ArF-resist and low-k insulating-layer processes, which have been developed to achieve higher levels of integration into microstructures. The Hitachi Model S-9260 CD-SEM system has been developed to meet the requirements of these new fabrication processes.
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